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(parent: 9654cf1) | patch
efl/evas: simplify dither mask handling.
authorGustavo Sverzut Barbieri <barbieri@gmail.com>
Thu, 6 Dec 2012 19:44:11 +0000 (19:44 +0000)
committerGustavo Sverzut Barbieri <barbieri@gmail.com>
Thu, 6 Dec 2012 19:44:11 +0000 (19:44 +0000)
commitbdbf2171fed19aca1d5995f5165474110ce81da4
tree7d696e9b10fa8cf41bd844c79960ec0d176fa888tree | snapshot
parent9654cf13f05dd799f30b1bc5ab9d8aa016004068commit | diff
efl/evas: simplify dither mask handling.

 * a single option --with-evas-dither-mask=TYPE (big, small, line or none).

 * make a wise decision to fallback to small dither mask for
   conversions that do not support "no-dither" or "line". Before if
   you did not specify it would fallback to big (128x128).

SVN revision: 80383
configure.ac diff | blob | history
m4/evas_dither.m4 [deleted file] blob | history
src/lib/evas/include/evas_common.h diff | blob | history
Domain: UI Framework / EFL;